Dry Film Photoresist Developer Ultra concentrate solution designed to work with our range of Negative working Dry Film Photo resist and Dry Film Solder mask products. This is a Potassium carbonate based developer that can be used in developing trays, immerse developing tanks or for optimal resolution a spray Developing processor machine should be used.
Bath make up for Photo imageable aqueous resists should be 1.8% – 2.6% depending on the type of dry film used.
Working Conditions
Optimum Exposure time prior to developing should be determined with a 21 Step Stouffer Step Wedge
Temperature 28-38 Degrees Celcius
pH Working Solution Discard when pH falls below 10.5 in accordance with local water authority regulations
Resist Loading Typical resist loading will be between 3-4 mil/ft2 per litre
1 Litre Developer Concentrate makes approximately a 45 Litre working solution
5 Litre Developer concentrate makes approximately a 225 Litre working solution
