Precision Etching Developing Machine Titan Rotator

£10,495.00

This presicion Etching machine is suitable for high precision pcb, modelling or printing applications

The  Titan3500 is a vertical etching machine for precision applications.  In contrast to conventional etching or developing machines, the substrate is rotated during the etching process on a clamping wheel. This prevents preferential directions and the process strips safely and reduces and prevents etching undercutting, this results in ultra fine developing or etching to 25u with no undercutting.

Precision Etch and Developing Machine Titan 3500 Rotator – Etching Center

This precicion Etching machine is suitable for high precision pcb, modelling or printing applications

The  Titan3500 is a vertical etching machine for precision applications.  In contrast to conventional etching or developing machines, the substrate is rotated during the etching process on a clamping wheel. This prevents preferential directions and the process strips safely and reduces and prevents etching undercutting.  This allows for ultra fine  micro etching or developing useful for production of items such as wafers etc.

The substrate is fitted into the clamping wheel and the wheel is mounted from above into the machine. The special nozzles are internally designed in a way, so that the full spray cone hits the substrate with a spin. During the etching process the clamping wheel with the substrate is continuously rotated by a gear motor and transport rollers. The rotating wheel and the spin of the spray cone of the precision nozzles ensure in cooperation with the uniform liquid flow of the etching medium particularly precise etching result.

The robust machine is predominantly (contacting the etchant area exclusively) made of PVC, PE, PP and titanium construction.

The etching progress can be visually inspected through the transparent PVC front. The etching process is automatically stopped by a timer. In addition, the etching can be stopped by lifting the cover (safety switch).

Technical Information

KRC

 

KRC

Power supply: 208/240 V 1 Phase 50/60 Hz
Power consumption: max. 2200W
Max. substrate size: 350mm x 350mm
Dimensions (LXDXH): 950x 750x 1100 mm
Working height: 1150 mm
Tank content: 28l
Etching pump: Magnetic centrifugal pump with approx. 80l/min throughput (gross)
Digital-timer for etching pump: 0-999 seconds
RPM: stepless adjustable
Weight: 90 kg
Heater: 1 x 800W Titanium heater, limited to 45°C
Weight 100 kg